Selective Laser Etching

Selective laser etching (SLE) is a subtractive laser technology allowing fabrication of complex-shape 3D glass parts with micrometer precision. This technology consists of two fabrications steps: femtosecond laser irradiation and subsequent chemical etching. Tightly focused femtosecond laser beam induces modifications of transparent material within the focal point of laser beam. By spatially moving the laser focus well-defined structure is written in point-by-point fashion up to substrate surface. Afterward, the sample is immersed in etchant solution, which etches out laser modified areas.

SLE is often used in the manufacturing of electronic devices and other precision components, as it allows for high levels of accuracy and detail in the etched patterns. Additionally, because the laser beam is highly focused, it can be used to etch very small and intricate designs.

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