Laser Nanofactory Selective Laser Etching


  • Subtractive manufacturing technique
  • Arbitrary-shaped 3D structures from glass µm to cm scale
  • Various glasses applicable
  • Self-alignment system for automatic laser beam alignment
  • Micrometer feature resolution

Selective laser etching (SLE) is a subtractive laser technology allowing fabrication of complex-shape 3D glass parts with micrometer precision. This technology consists of two fabrications steps: femtosecond laser irradiation and subsequent chemical etching. Tightly focused femtosecond laser beam induces modifications of transparent material within the focal point of laser beam. By spatially moving the laser focus well-defined structure is written in point-by-point fashion up to substrate surface. Afterward, the sample is immersed in etchant solution, which etches out laser modified areas.

SLE is often used in the manufacturing of electronic devices and other precision components, as it allows for high levels of accuracy and detail in the etched patterns. Additionally, because the laser beam is highly focused, it can be used to etch very small and intricate designs.

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Technology Substractive manufacturing
Materials Fused silica, Borofloat 33
Smallest feature size > 1 μm
Minimum surface roughness < 200 nm
Maximum object height 1 cm
Aspect ratio > 1 : 200
Minimum micro hole diameter 5 µm
Writing speed 50 mm/s
Femtosecond Laser Source
Wavelength 1030 ± 10 nm
Repetition rate Single-shot – 1 MHz
Pulse duration 290 fs – 20 ps (tunable)
Max. average power 10 W
Long-term power stability < 0.5% RMS over 100 h
Linear stages with synchronized Galvano scanners
XYZ positioning stages mounted on granite base with bridge Travel (XYZ) 1) 160 mm × 160 mm × 60 mm
Accuracy (XYZ) ± 300 nm
Resolution (XYZ) 1 nm
Maximum speed (XY) 200 mm/s
Galvano scanners Accuracy 50 μrad
Repeatability 0.4 µrad RMS
  1. Customizable.
Other parameters
Monitoring on time The fabrication process is monitored by an integrated machine vision system
Stitching Stitchless fabrication using Infinite Field of View (IFoV)
Focusing optics  Objectives – from 0.25 to 0.45 NA 1)
Autofocus system Automatic glass/polymer or glass/air interface optical detection
Self-Align-System (SAS) Automatic laser beam path alignment system
Substrate Universal vacuum sample holder with computer-controlled, position synchronized illumination for transparent samples
Beam delivery & control Motorized attenuator, polarization rotator, beam expander. Integrated power meter enables real-time power monitoring
Software Convenient control of all necessary process parameters and machine settings. The software handles standard formats of 3D designs created by popular CAD programs, like STL
Laser safety Ergonomic housing to ensure laser safety class 1 and environment stability conditions for laser microfabrication process
  1. Customizable.
Physical Dimensions
Dimensions when all doors are closed (W × L × H) 1790 mm × 920 mm × 2270 mm
Dimensions when doors are opened (W × L × H) 2680 mm × 1900 mm × 2300 mm
Weight ~ 700 kg
Environmental & Utility Requirements
Operating temperature 1) 20 ± 2 °C
Relative humidity 1) ≤ 60%
Electrical requirements 110 V AC, 20 A – 230 V AC , 10 A
AC power (normal operation) typical 2 kW
  1. The conditions of the environment are preferred to be as stable as possible.

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